聚酰亞胺薄膜及F46復合薄膜

聚酰亞胺薄膜及F46復合薄膜

Polyimide film and F46 compound film

聚酰亞胺薄膜具有優良的耐高低溫性、電氣絕緣性、粘結性、耐輻射性、耐介質性，能在低至-269℃高至+400℃的溫度范圍內長期使用；復合亞胺薄膜還具有高溫自粘性的特點，它們可作耐高溫柔性印刷電路基材、扁平電路、電線電纜、電磁線的絕緣層以及用作各種電機的絕緣等。目前已廣泛地應用于飛機、航天器、核工業、核潛艇、電力機車、音響器件、儀表通訊、石油化工等工業部門。

Polyimide film and F46 polyimide Fluoropolymer compounded film have excellent high-low temperature and radiation resistance, perfect electrical insulating properties, good adherence, and chemical resistance. Polyimide film can be used in temperature from low zero 269 to high 400℃ for a long span. Fluoropolymer compound film has self-bonding propertise, Both can be used in flexible printed circuits and as insulating materials of flat electric cables, electromagnetic wires and motors.

It is widely used in airplane, spacecrafts, nuclear industry, nuclear submarine, electric locomotive, Audio devices, communication equipment and in petrochemical industry.